Our UHV system concept bases on a central transfer chamber surrounded by multiple modules. This allows the transfer of a sample from one chamber into another without venting it. This is done by the advanced transfer manipulator, which is located in the centre of the transfer chamber (=cluster). Transfer chamber and load lock chamber building one unit and allow the introduction and replacement of substrates and targets into and from the UHV conditions (10-9 mbar range).
Our system is composed of:
- two transfer chambers (=clusters)
- a mask chamber
- a transfer tunnel
- two load lock modules
- three PLD modules
- an XPS